`` If the brain were so simple we could understand it, we would be so simple we couldn't.''Lyall Watson
Thermal donors remain one of the great unsolved problems in defect
physics. First discovered over 45 years ago, their microscopic
structure still remains a mystery. They are a family of up to 17
double donor defects [227] that appear in oxygen-rich Si (TD1
TD17) when annealed in the temperature range
300-550
C [227,228,229]. Higher
temperature anneals lead to their destruction but also the growth of
other, `new donor' centres. In addition, higher temperature anneals
lead to quartz precipitation, and associated build-up of Sii and
prismatic dislocation loops. Therefore Si is often subjected to rapid
high temperature anneals to break up these oxygen clusters followed by
quenching before other defect centres have time to form.
There is incentive to understand thermal donors from two camps.
Firstly decreased tolerance chip design means that future processing
will demand lower temperature anneals and less processing steps, which
means that a thorough understanding of the thermal donors will become
increasingly important. Secondly, despite being probably the most
studied point defects in semiconductor materials to date they have
remained intransient, and thus understanding them provides one of the
greatest challenges to the point defect research
community.
Experimental examination has revealed no other impurity atoms in these
centres apart from Oi, and so it appears that they can only consist
of Oi, possibly Sii or V, and lattice Si. Any complete model
appears doomed to conflict with some of the experimental evidence,
given the amount of material collected over the years. Hence we
attempt to postulate here a model which agrees with the majority of
results currently available; there are no doubt exceptions in the
literature.
In this chapter we consider a number of different models for the thermal donor based around only Oi and lattice Si, and show that a model consisting of four Oi atoms, based around a `di-y-lid' core, can account for many of the experimental observations. We discuss possible formation methods for these defects.